时间：2026年6月29日下午3:00
地点：理工楼18号楼-307会议室
主讲：You Wang, Ph. D., National Distinguished Professor, Southwest Institute of Technical Physics
主办：光电与信息工程学院，医学光电科学与技术教育部重点实验室，福建省光子技术重点实验室。福建省光学学会
专家简介
Prof. You Wang received the B.S. degree in laser technology from Zhejiang University, Hangzhou, China, in 1986, and the M.Sc. degree in optics from Chinese Academy of Science (registered in Hefei University of Technology), Hefei, China, in 1991, respectively. He received the Ph.D. degree in electronics/communication from Tohoku University, Sendai, Japan, in 1997. After then, he worked as an assistant professor of Tohoku University, a researcher of the major institutes of RICOH Co. Ltd, and a laser scientist of both the Center Laboratory of HPK Co. Ltd and Institute of Physical and Chemical Research of Japan (RIKEN) for more than 15 years. He is currently a national distinguished professor of China with Southwest Institute of Technical Physics, China. He is also involved in various aspects of theory and practice of several types of lasers as well as their industrial applications. His current research interests include kinetic processes, molecular and atomic physics, solid-state lasers, semiconductor lasers, gas lasers, image processing, micro laser processing, special waveguides and optoelectronic technology. These works have been published in more than 300 refereed scientific papers (reviews) in the scientific journals and academic conferences. He has also applied more than 60 patents in China, Japan, the Unite States, and Europe Union. He is a member of several national special committees belong to the Optical Society of China (OSC), Chinese Society for Optical Engineering (CSOE), China Instrument and Control Society (CIS), the Optical Society of America (OSA), the Laser Society of Japan (LSJ), and Optics and Photonics Society of Singapore (OPSS). He is the chief editor of Laser Technologyof China (in Chinese). He is also the members of the Editorial Board for the International Journal of Optics and Applications, Scientific & Academic Publishing (SAP).
讲座简介
Laser direct processing for various materials has been widely used for many applications. However, the structure size is limited by the normal optical diffraction. When the processing resolution approaches to the theoretical limit, a lot of technical problems will emerge and the cost will become extremely high. With respect to laser processing, the minimum feature size and processing resolution of optical devices are inevitably limited by the diffraction limit of a laser Gaussian beam. The laser-based processing used in nano-optics and photonics cannot be further developed until the diffraction limit is broken. Several fantastic regimes in realization of mirco-processing beyond the diffraction limit, including surface plasmon polaritons (SPPs) and evanescent wave interference lithography (EWIL), the quasi-Bessel beam procedure, the super-resolution photoinduction-inhibition nanolithography (SPIN), and the radially polarized regime, etc., will be introduced in this report. One can see that the diffraction limit could be broken by using these methodologies. Once such technologiescome true, advanced photonic devices will be of high speed, high resolution and high integration, forming various types of optical and photonic chips and disks.
